## Abstract Al~2~O~3~/Si~3~N~4~ insulatedβgate AlGaN/GaN heterostructure fieldβeffect transistors (HFETs) have been fabricated, where the regrown ohmic structure was incorporated to reduce the contact resistance. Excellent DC and RF characteristics have been obtained together with the low gate leak
β¦ LIBER β¦
Systematic Study of Insulator Deposition Effect (Si 3 N 4 , SiO 2 , AlN, and Al 2 O 3 ) on Electrical Properties in AlGaN/GaN Heterostructures
β Scribed by Maeda, Narihiko; Hiroki, Masanobu; Watanabe, Noriyuki; Oda, Yasuhiro; Yokoyama, Haruki; Yagi, Takuma; Makimoto, Toshiki; Enoki, Takatomo; Kobayashi, Takashi
- Book ID
- 124089497
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2007
- Tongue
- English
- Weight
- 248 KB
- Volume
- 46
- Category
- Article
- ISSN
- 0021-4922
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
RF and DC characteristics in Al2O3/Si3N4
β
Maeda, Narihiko ;Makimura, Takashi ;Maruyama, Takashi ;Wang, Chengxin ;Hiroki, M
π
Article
π
2006
π
John Wiley and Sons
π
English
β 224 KB
Electrical insulation properties of sput
β
Bartzsch, Hagen ;GlΓΆΓ, Daniel ;Frach, Peter ;Gittner, Matthias ;SchultheiΓ, Eber
π
Article
π
2009
π
John Wiley and Sons
π
English
β 806 KB
## Abstract In this paper the breakdown field strength and resistivity of sputterβdeposited Al~2~O~3~, SiO~2~ and Si~3~N~4~ layers are investigated in the temperature range between room temperature and 400 Β°C. All the investigated layers showed excellent insulation properties, even at elevated samp
Superior suppression of gate current lea
β
C. X. Wang; N. Maeda; M. Hiroki; T. Tawara; T. Makimoto; T. Kobayahsi; T. Enoki
π
Article
π
2005
π
Springer US
π
English
β 123 KB
Mechanism of Superior Suppression Effect
β
Wang, Chengxin; Maeda, Narihiko; Hiroki, Masanobu; Yokoyama, Haruki; Watanabe, N
π
Article
π
2006
π
Institute of Pure and Applied Physics
π
English
β 148 KB
Effect of physicochemical treatment of i
β
V. A. Izhevskii; M. S. Koval'chenko
π
Article
π
1997
π
Springer
π
English
β 978 KB
The effects of RF power on the interfaci
β
Kim, Hyungchul; Woo, Sanghyun; Lee, Jaesang; Lee, Hyerin; Jeon, Hyeongtag
π
Article
π
2010
π
Institute of Physics
π
English
β 851 KB