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Mechanism of Superior Suppression Effect on Gate Current Leakage in Ultrathin Al 2 O 3 /Si 3 N 4 Bilayer-Based AlGaN/GaN Insulated Gate Heterostructure Field-Effect Transistors

✍ Scribed by Wang, Chengxin; Maeda, Narihiko; Hiroki, Masanobu; Yokoyama, Haruki; Watanabe, Noriyuki; Makimoto, Toshiki; Enoki, Takotomo; Kobayashi, Takashi


Book ID
126166028
Publisher
Institute of Pure and Applied Physics
Year
2006
Tongue
English
Weight
148 KB
Volume
45
Category
Article
ISSN
0021-4922

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RF and DC characteristics in Al2O3/Si3N4
✍ Maeda, Narihiko ;Makimura, Takashi ;Maruyama, Takashi ;Wang, Chengxin ;Hiroki, M πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 224 KB

## Abstract Al~2~O~3~/Si~3~N~4~ insulated‐gate AlGaN/GaN heterostructure field‐effect transistors (HFETs) have been fabricated, where the regrown ohmic structure was incorporated to reduce the contact resistance. Excellent DC and RF characteristics have been obtained together with the low gate leak