Remote Hydrogen Microwave Plasma CVD of
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A.โM. Wrobel; I. Blaszczyk-Lezak
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Article
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2007
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John Wiley and Sons
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English
โ 346 KB
๐ 2 views
## Abstract The silicon carbonitride (Si:C:N) films produced by hydrogen remote microwave plasma (RP)CVD from a 1,1,3,3โtetramethyldisilazane precursor at various substrate temperatures (35โ400โยฐC) are examined in terms of their physical (density), optical (refractive index), and mechanical (hardne