✦ LIBER ✦
Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride filmsElectronic supplementary information (ESI) available: deconvoluted emission and IR spectra of a-Si–N–C–H films. See http://www.rsc.org/suppdata/jm/b2/b211415c/
✍ Scribed by Wróbel, A. M.; Błaszczyk, I.; Walkiewicz-Pietrzykowska, A.; Tracz, A.; Klemberg-Sapieha, J. E.; Aoki, T.; Hatanaka, Y.
- Book ID
- 121410686
- Publisher
- Royal Society of Chemistry
- Year
- 2003
- Tongue
- English
- Weight
- 269 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0959-9428
- DOI
- 10.1039/B211415C
No coin nor oath required. For personal study only.