Filament-activated chemical vapour depos
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Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari
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Article
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1996
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John Wiley and Sons
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English
β 987 KB
We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun