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Synthesis of aluminium nitride thin films by ion-vapour deposition method

✍ Scribed by Yoshikazu Nakamura; Yoshihisa Watanabe; Shigekazu Hirayama; Yuusaku Naota


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
865 KB
Volume
68-69
Category
Article
ISSN
0257-8972

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We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun