Plasma-Enhanced Atomic Layer Deposition
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G.βA. TenβEyck; S. Pimanpang; J.βS. Juneja; H. Bakhru; T.-M. Lu; G.-C. Wang
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Article
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2007
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John Wiley and Sons
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English
β 253 KB
π 1 views
## Abstract In this paper, a method for the plasmaβenhanced (PE) atomic layer deposition (ALD) of palladium on airβexposed, annealed poly(__p__βxylylene) (ParyleneβN, or PPX) is presented. Palladium is successfully deposited on PPX at 80βΒ°C using a remote, inductively coupled, hydrogen/nitrogen pla