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Atomic Layer Deposition of Pd on an Oxidized Metal Substrate

✍ Scribed by G. A. Ten Eyck; S. Pimanpang; H. Bakhru; T.-M. Lu; G.-C. Wang


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
270 KB
Volume
12
Category
Article
ISSN
0948-1907

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Plasma-Enhanced Atomic Layer Deposition
✍ G. A. Ten Eyck; S. Pimanpang; J. S. Juneja; H. Bakhru; T.-M. Lu; G.-C. Wang 📂 Article 📅 2007 🏛 John Wiley and Sons 🌐 English ⚖ 253 KB 👁 1 views

## Abstract In this paper, a method for the plasma‐enhanced (PE) atomic layer deposition (ALD) of palladium on air‐exposed, annealed poly(__p__‐xylylene) (Parylene‐N, or PPX) is presented. Palladium is successfully deposited on PPX at 80 °C using a remote, inductively coupled, hydrogen/nitrogen pla