Plasma-Enhanced Atomic Layer Deposition
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G. A. Ten Eyck; S. Pimanpang; J. S. Juneja; H. Bakhru; T.-M. Lu; G.-C. Wang
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Article
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2007
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John Wiley and Sons
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English
⚖ 253 KB
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## Abstract In this paper, a method for the plasma‐enhanced (PE) atomic layer deposition (ALD) of palladium on air‐exposed, annealed poly(__p__‐xylylene) (Parylene‐N, or PPX) is presented. Palladium is successfully deposited on PPX at 80 °C using a remote, inductively coupled, hydrogen/nitrogen pla