Chemical Infiltration during Atomic Layer Deposition: Metalation of Porphyrins as Model Substrates

✍ Scribed by Lianbing Zhang; Avinash J. Patil; Le Li; Angelika Schierhorn; Stephen Mann; Ulrich Gösele; Mato Knez

• Publisher: John Wiley and Sons
• Year: 2009
• Tongue: English
• Weight: 475 KB
• Volume: 121
• Category: Article
• ISSN: 0044-8249
• DOI: 10.1002/ange.200900426