We investigated the aluminum distribution in aluminum-doped zinc oxide films grown by atomic layer deposition. Surface morphology, structure, composition and electrical properties of obtained films were studied. For the aluminum content less than 2 at.%, a periodicity of Al distribution along the la
β¦ LIBER β¦
Film Uniformity in Atomic Layer Deposition
β Scribed by K.-E. Elers; T. Blomberg; M. Peussa; B. Aitchison; S. Haukka; S. Marcus
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 544 KB
- Volume
- 12
- Category
- Article
- ISSN
- 0948-1907
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