𝔖 Bobbio Scriptorium
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SU-8 as resist material for deep X-ray lithography

✍ Scribed by C. Cremers; F. Bouamrane; L. Singleton; R. Schenk


Publisher
Springer-Verlag
Year
2001
Tongue
English
Weight
176 KB
Volume
7
Category
Article
ISSN
0946-7076

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