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Highly sensitive resist material for deep X-ray lithography

✍ Scribed by R. Schenk; O. Halle; K. Müllen; W. Ehrfeld; M. Schmidt

Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 280 KB
Volume: 35
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(96)00165-7

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