✦ LIBER ✦
Simulation of deep UV lithography with SU-8 resist by using 365 nm light source
✍ Scribed by X. Tian; G. Liu; Y. Tian; P. Zhang; X. Zhang
- Publisher
- Springer-Verlag
- Year
- 2005
- Tongue
- English
- Weight
- 588 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0946-7076
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