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Study on the mechanical and chemical properties of (Ti,Al)N films prepared by DC magnetron sputtering

✍ Scribed by Shengrui Jiang; Dongliang Peng; Xueying Zhao; Liang Xie; Qiang Li


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
385 KB
Volume
84
Category
Article
ISSN
0169-4332

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A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p