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Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target

✍ Scribed by Shozo Inoue; Hitoshi Uchida; Atsushi Hioki; Keiji Koterazawa; Ronald P. Howson

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
486 KB
Volume
271
Category
Article
ISSN
0040-6090

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A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p