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Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering

โœ Scribed by Longyan Yuan; Guojia Fang; Chun Li; Mingjun Wang; Nishuang Liu; Lei Ai; Yanzhao Cheng; Huimin Gao; Xingzhong Zhao


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
181 KB
Volume
253
Category
Article
ISSN
0169-4332

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Influence of annealing in N2 on the prop
โœ Limei Lin; Fachun Lai; Yan Qu; Rongquan Gai; Zhigao Huang ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 539 KB

In 2 O 3 :Sn (ITO) films were deposited on quartz substrates by direct current magnetron sputtering and annealed in N 2 at temperatures ranging from 150 to 350 โ€ข C for 1 h. The structure and morphology of the films were investigated by X-ray diffraction and atomic force microscopy. The results demon