Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates

✍ Scribed by S. Van Elshocht; M. Caymax; T. Conard; S. De Gendt; I. Hoflijk; M. Houssa; F. Leys; R. Bonzom; B. De Jaeger; J. Van Steenbergen; W. Vandervorst; M. Heyns; M. Meuris

• Book ID: 108289130
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 214 KB
• Volume: 508
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2005.08.406