✦ LIBER ✦
ChemInform Abstract: Atomic Layer Deposition for CMOS Scaling: High-k Gate Dielectrics on Si, Ge, and III—V Semiconductors
✍ Scribed by Martin M. Frank
- Publisher
- John Wiley and Sons
- Year
- 2008
- Weight
- 15 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0931-7597
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