a-Plane GaN templates were grown on r-plane sapphire substrate by metalorganic vapor phase epitaxy (MOVPE) and then undoped a-plane GaN layers were grown at different growth temperatures on the a-plane GaN templates by plasma-assisted molecular beam epitaxy (PA-MBE). In order to investigate the effe
Studies on the InGaGdN/GaN magnetic semiconductor heterostructures grown by plasma-assisted molecular-beam epitaxy
β Scribed by S.N.M. Tawil; D. Krishnamurthy; R. Kakimi; S. Emura; S. Hasegawa; H. Asahi
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 348 KB
- Volume
- 323
- Category
- Article
- ISSN
- 0022-0248
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β¦ Synopsis
InGaGdN single-layer and InGaGdN/GaN superlattice (SL) structures were grown on the MOVPE-grown GaN (0 0 0 1) template substrates by radio frequency molecular beam epitaxy. X-ray diffraction spectroscopy and X-ray absorption fine structure data showed no existence of a secondary phase such as GdN or InN and the Gd atom occupation at the group-III site. Magnetization versus magnetic field curves exhibited clear hysteresis and saturation at both 10 and 300 K. The InGaGdN/GaN SL sample showed higher saturation magnetization per volume than the InGaGdN single-layer sample.
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