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Structures and electrical properties of zinc oxide films prepared by low pressure sputtering system

✍ Scribed by Toshio Hada; Kiyotaka Wasa; Shigeru Hayakawa


Book ID
107859826
Publisher
Elsevier Science
Year
1971
Tongue
English
Weight
777 KB
Volume
7
Category
Article
ISSN
0040-6090

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✍ Atanas TanuΕ‘evski; Verka Georgieva πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 673 KB

The nanocrystal thin films of zinc oxide doped by Al (ZnO:Al) were deposited by dc reactive magnetron sputtering on the glass substrates, in the pressure range of 33-51 Pa. From the X-ray diffraction patterns, the nanocrystalline structure of ZnO:Al films and the grain size were determined. The opti