A number of alkylsilanes and alkylcarbosilanes of widely different molecular structure are characterized in terms of their ability to form amorphous hydrogenated silicon-carbon (a-Si:C:H) films in atomic hydrogen-induced chemical vapor deposition (AHCVD). The compounds containing only Si-C and C-H b
✦ LIBER ✦
Structure–Property Relationships of Amorphous Hydrogenated Silicon–Carbon Films Produced by Atomic Hydrogen–Induced CVD from a Single-Source Precursor
✍ Scribed by A. M. Wróbel; S. Wickramanayaka; K. Kitamura; Y. Nakanishi; Y. Hatanaka
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 505 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0948-1907
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