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Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering

✍ Scribed by Peng, Gao; Jun, Xu; Yong, Piao; Wanyu, Ding; Xinlu, Deng; Chuang, Dong

Book ID: 121439887
Publisher: IOP Publishing
Year: 2006
Tongue: English
Weight: 466 KB
Volume: 8
Category: Article
ISSN: 1009-0630
DOI: 10.1088/1009-0630/8/4/12

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