✦ LIBER ✦

Deposition of Hydrogen-Free Silicon Nitride Thin Films by Microwave ECR plasma Enhanced Magnetron Sputtering at Room Temperature

✍ Scribed by Wan-Yu, Ding; Jun, Xu; Yong, Piao; Yan-Qin, Li; Peng, Gao; Xin-Lu, Deng; Chuang, Dong

Book ID: 121437741
Publisher: Institute of Physics
Year: 2005
Tongue: English
Weight: 204 KB
Volume: 22
Category: Article
ISSN: 0256-307X
DOI: 10.1088/0256-307X/22/9/053

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Characterization of silicon nitride thin

Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures

✍ Takeyama, Mayumi B.; Sato, Masaru; Nakata, Yoshihiro; Kobayashi, Yasushi; Nakamu 📂 Article 📅 2014 🏛 Institute of Pure and Applied Physics 🌐 English ⚖ 426 KB

Structure and Tribology Property of Carb

Structure and Tribology Property of Carbon Nitride Films Deposited by MW-ECR Plasma Enhanced Unbalanced Magnetron Sputtering

✍ Peng, Gao; Jun, Xu; Yong, Piao; Wanyu, Ding; Xinlu, Deng; Chuang, Dong 📂 Article 📅 2006 🏛 IOP Publishing 🌐 English ⚖ 466 KB

Wet etching studies of silicon nitride t

Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition

✍ K.B. Sundaram; R.E. Sah; H. Baumann; K. Balachandran; R.M. Todi 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 194 KB

Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p

Low-Hydrogen-Content Silicon Nitride Dep

Low-Hydrogen-Content Silicon Nitride Deposited at Room Temperature by Inductively Coupled Plasma Deposition

✍ Zhou, Haiping; Elgaid, Khaled; Wilkinson, Chris; Thayne, Iain 📂 Article 📅 2006 🏛 Institute of Pure and Applied Physics 🌐 English ⚖ 204 KB

Crystalline SiC thin films deposited at

Crystalline SiC thin films deposited at room temperature using pulsed laser ablation of graphite and magnetron sputtering of silicon

✍ Nainaparampil, Josekutty J.; Zabinski, Jeffrey S. 📂 Article 📅 1999 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 913 KB

Application of the ERD method for hydrog

Application of the ERD method for hydrogen determination in silicon (oxy) nitride thin films prepared by ECR plasma deposition

✍ L. Hrubčín; J. Huran; R. Šandrik; A.P. Kobzev; D.M. Shirokov 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 345 KB