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Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures

✍ Scribed by Takeyama, Mayumi B.; Sato, Masaru; Nakata, Yoshihiro; Kobayashi, Yasushi; Nakamura, Tomoji; Noya, Atsushi

No coin nor oath required. For personal study only.

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