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Structural characterization of silicon films deposited at low temperature by remote plasma enhanced chemical vapor deposition

✍ Scribed by Xiaodong Li; Young-Bae Park; Dong-Hwan Kim; Shi-Woo Rhee


Book ID
119125503
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
397 KB
Volume
24
Category
Article
ISSN
0167-577X

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