Advances in plasma-enhanced chemical vapor deposition of silicon films at low temperatures

✍ Scribed by R.W. Collins; A.S. Ferlauto

• Book ID: 117756918
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 617 KB
• Volume: 6
• Category: Article
• ISSN: 1359-0286
• DOI: 10.1016/s1359-0286(02)00095-5