𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Structure and dielectric properties of amorphous LiNbO3 thin films prepared by a sputtering deposition

✍ Scribed by Kitabatake, Makoto; Mitsuyu, Tsuneo; Wasa, Kiyotaka


Book ID
121359739
Publisher
American Institute of Physics
Year
1984
Tongue
English
Weight
526 KB
Volume
56
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Mechanical properties of amorphous carbo
✍ Dong Li; Yip-Wah Chung; Ming-Show Wong; William D. Sproul πŸ“‚ Article πŸ“… 1995 πŸ› Springer US 🌐 English βš– 379 KB

Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partia

Structure and dielectric properties of Z
✍ J. Zhu; Z.G. Liu πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 147 KB

Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat