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Structural, optical and electrical properties of μc-Si:H deposited by ECR

✍ Scribed by M. Mars; M. Fathallah; E. Tresso; S. Ferrero

Book ID
117145692
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
193 KB
Volume
299-302
Category
Article
ISSN
0022-3093

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## Abstract The effect of bias voltage on characteristics of ZnO thin films deposited by the electron cyclotron resonance plasma‐enhanced chemical vapor deposition (ECR‐PECVD) method was investigated. The structural, optical and electrical properties of ZnO thin films were studied as a function of