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Effects of substrate bias on structure and properties of a-Si:H films deposited by ECR microwave plasmas

✍ Scribed by T.V. Herak; T.T. Chau; S.R. Mejia; P.K. Shufflebotham; J.J. Schellenberg; H.C. Card; K.C. Kao; R.D. McLeod

Book ID: 115985922
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 207 KB
Volume: 97-98
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(87)90066-4

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