We have found the deposition technology at which the interface roughness of Nb/Si multi/a yer is strongly correlated and decreases with deposited layer number. On the basis of our Nb/Si multilayer we succeeded to prepare ten-fold stacked Josephson junction (JJ). Basic electric properties of stacked
✦ LIBER ✦
Structural and electrical properties of highly conductive μc-Si(P) layers
✍ Scribed by G. Conte; M.L. Addonizio; G. Nobile; A. Rubino; E. Terzini
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 326 KB
- Volume
- 70-71
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
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