Structural evolution of ZnO films deposited by rf magnetron sputtering on glass substrate

✍ Scribed by Liao, Yan-Ping ;Zhang, Jian-Hua ;Li, Shu-Xin ;Guo, Zhan-Sheng ;Cao, Jin ;Zhu, Wen-Qing ;Li, Xifeng

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 520 KB
• Volume: 207
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200925131

✦ Synopsis

Abstract

Influences of O~2~/Ar flux ratio (R) on surface morphology and structural evolution have been studied in the case of ZnO films deposited on glass substrates by radio‐frequency (rf) magnetron sputtering. Results of atomic force microscopy (AFM), X‐ray diffraction, and X‐ray photoelectron spectroscopy (XPS) clearly indicate that the surface root‐mean‐square (rms) roughness, crystallinity, stress, and defects strongly depend on the R. At R = 1/2, the crystallized ZnO film with highly c‐axis orientation and highly smooth surface has been obtained. The implication of these results is that a moderate R is needed to realize high‐quality ZnO film.