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Structural and optical properties of titanium dioxide films deposited by reactive magnetron sputtering in pure oxygen plasma

โœ Scribed by Asanuma, T.; Matsutani, T.; Liu, C.; Mihara, T.; Kiuchi, M.

Book ID
115493366
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
336 KB
Volume
95
Category
Article
ISSN
0021-8979

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The NiO x thin films were deposited by reactive dc-magnetron sputtering from a nickel metal target in Ar + O 2 with the relative O 2 content 5%. The as-deposited NiO x thin films could represent a two-component system comprising crystalline NiO particles dispersed in an amorphous Ni 2 O 3 . Decompos