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Structural and electrical properties of CuAlMo thin films prepared by magnetron sputtering

✍ Scribed by Birkett, Martin; Penlington, Roger; Wan, Chaoying; Zoppi, Guillaume

Book ID
122943853
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
742 KB
Volume
540
Category
Article
ISSN
0040-6090

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Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp