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Structural and dielectric properties of Ti and Er co-doped HfO2 gate dielectrics grown by RF sputtering

✍ Scribed by Khaskheli, Murad Ali; Wu, Ping; Chand, Ram; Li, Xianfei; Wang, Hui; Zhang, Shiping; Chen, Sen; Pei, Yili


Book ID
122536324
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
796 KB
Volume
266
Category
Article
ISSN
0169-4332

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