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Effects of substrate temperature on dielectric and structural properties of Ti and Er co-doped HfO2 thin films

โœ Scribed by Murad Ali Khaskheli; Ping Wu; Xianfei Li; Hui Wang; Shiping Zhang; Sen Chen; Yili Pei


Book ID
116965140
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
691 KB
Volume
86
Category
Article
ISSN
0042-207X

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This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate