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Strain relaxation in SiGe layer during wet oxidation process

โœ Scribed by Yong Zhang; Kunhuang Cai; Cheng Li; Songyan Chen; Hongkai Lai; Junyong Kang


Book ID
108063784
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
820 KB
Volume
255
Category
Article
ISSN
0169-4332

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