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Wet oxidation of GeSi strained layers by rapid thermal processing

โœ Scribed by Nayak, D. K.; Kamjoo, K.; Park, J. S.; Woo, J. C. S.; Wang, K. L.


Book ID
119961960
Publisher
American Institute of Physics
Year
1990
Tongue
English
Weight
647 KB
Volume
57
Category
Article
ISSN
0003-6951

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