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Retardation of strain relaxation in Si/SiGe/Si heterostructures during high temperature oxidation

✍ Scribed by ChangChun Chen; A.-C Lindgren; ShiLi Zhang; DeZhang Zhu

Book ID: 114166057
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 189 KB
Volume: 194
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(02)01035-2

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