Strain effects in epitaxial GaN grown on AlN-buffered Si(111)
β Scribed by Meng, W. J.; Perry, T. A.
- Book ID
- 120553697
- Publisher
- American Institute of Physics
- Year
- 1994
- Tongue
- English
- Weight
- 792 KB
- Volume
- 76
- Category
- Article
- ISSN
- 0021-8979
- DOI
- 10.1063/1.357916
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## Abstract The strain distribution and defects in a graded AlN/GaN heterostructure comprising AlN layers from 3 nm up to 100 nm grown by plasmaβassisted MBE were studied using transmission electron microscopy techniques. Gradual strain relaxation was observed as well as strain partitioning between
This work presents a detailed study of the subgrain structure of Si doped GaN grown on AlN buffered (111)Si substrates by plasma-assisted Molecular Beam Epitaxy. Si doping increases from an unintentionally undoped sample up to 1.7 Γ 10 19 cm -3 . The subgrain size distribution fits quite precisely a