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Strain and strain-release engineering at epitaxial SiGe islands on Si(0 0 1) for microelectronic applications

✍ Scribed by G. Vastola; A. Marzegalli; F. Montalenti; Leo Miglio

No coin nor oath required. For personal study only.

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Strain and strain-release engineering at epitaxial SiGe islands on Si(0&#xa0;0&#xa0;1) for microelectronic applications