Stencil masks for high energy ion projection

✍ Scribed by U. Weidenmüller; J. Meijer; A. Stephan; H.H. Bukow; C. Rolfs

• Book ID: 104306550
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 946 KB
• Volume: 46
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(99)00048-9

✦ Synopsis

A high energy ion projector under construction will allow mask controlled ion beam implantation at demagnification between 10x and 100x. For energetic ions the material of the mask must be chosen in view of the required values of the stopping power and heat conduction. Thermal expansion and sputter effects are to be minimised. In a first experiment a 16x reduced projection of a copper mask with 20 #m wide structures was realized. To improve the resolution to 250 nm on the target mask structures of 4 #m are required.