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Open silicon stencil masks for demagnifying ion projection

✍ Scribed by A. Heuberger; L.-M. Buchmann; L. Csepregi; K.P. Müller

Book ID
103597946
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
608 KB
Volume
6
Category
Article
ISSN
0167-9317

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A high energy ion projector under construction will allow mask controlled ion beam implantation at demagnification between 10x and 100x. For energetic ions the material of the mask must be chosen in view of the required values of the stopping power and heat conduction. Thermal expansion and sputter