Characterization of silicon open stencil masks in an ion projection lithography machine

✍ Scribed by L.-M. Buchmann; U. Mescheder; M. Torkler

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 329 KB
• Volume: 13
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(91)90110-y