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Application of stencil masks for ion beam lithographic patterning

✍ Scribed by Brun, S.; Savu, V.; Schintke, S.; Guibert, E.; Keppner, H.; Brugger, J.; Whitlow, H.J.


Book ID
123434682
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
904 KB
Volume
306
Category
Article
ISSN
0168-583X

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We report on the use of a carbon-rich Pt-based material, obtained by electron and ion beam assisted deposition from metal-organic precursor, as a mask for pattern transfer processes. Thin and narrow mask patterns subjected to oxygen plasma and reactive ion etching (RIE) of silicon in SF 6 were inves