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Stability of plasma-deposited SiO2 films evaluated using stress and IR measurements

✍ Scribed by H. Gokan; A. Morimoto; M. Murahata

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 462 KB
Volume: 149
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(87)90251-3

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