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A Study of Stress in Microwave Plasma Chemical Vapor Deposited Diamond Films Using X-Ray Diffraction

✍ Scribed by M. Shahidul Haque; Prof. Hameed A. Naseem; Prof. Ajay P. Malshe; Prof. William D. Brown

Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
1006 KB
Volume
3
Category
Article
ISSN
0948-1907

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The diamond Raman lines were examined around the He' ion implantation-induced channels in chemical vapor deposited Ðlms over Si substrates. Several spectra from di †erent positions around the channels, formed at di †erent target currents, were obtained using a Raman microprobe. It is concluded that