✦ LIBER ✦
1.20 Regions of stability of SiO2 and Si3Ni4 during silicon etching prior to epitaxial film deposition
✍ Scribed by W Reidl
- Publisher
- Elsevier Science
- Year
- 1967
- Tongue
- English
- Weight
- 175 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0042-207X
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