Stability of IrTa diffusion barriers

✍ Scribed by R. De Reus; F.W. Saris; J.C. Barbour

• Book ID: 103952780
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 801 KB
• Volume: 7
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/0921-5107(90)90017-6

✦ Synopsis

The thermal and chemical stability of amorphous and crystalline Ir-Ta diffusion barriers between silicon and aluminium is investigated A failure temperature of 550 °C is found for amorphous Ir45Ta55 at the alummium interface. The reaction between amorphous Ir45Tas~ and silicon occurs at temperatures as high as 875 °C. The latter reaction temperature ts lowered to 700 °C when crystalline Ir-Ta is used.