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Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations

✍ Scribed by J.S. Reid; E. Kolawa; R.P. Ruiz; M.-A. Nicolet


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
520 KB
Volume
236
Category
Article
ISSN
0040-6090

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