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Amorphous Ta-Si-N diffusion barriers in Si/Al and Si/Cu metallizations

โœ Scribed by E. Kolawa; P.J. Pokela; J.S. Reid; J.S. Chen; M.-A. Nicolet


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
364 KB
Volume
53
Category
Article
ISSN
0169-4332

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