Stability of IrTa diffusion barriers
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R. De Reus; F.W. Saris; J.C. Barbour
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Article
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1990
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Elsevier Science
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English
⚖ 801 KB
The thermal and chemical stability of amorphous and crystalline Ir-Ta diffusion barriers between silicon and aluminium is investigated A failure temperature of 550 °C is found for amorphous Ir45Ta55 at the alummium interface. The reaction between amorphous Ir45Tas~ and silicon occurs at temperatures